Gore claims filter family improves performance

Published: 30-Jun-2010

Reduce total cost of ultrapure and DI water filtration

W L Gore & Associates (Gore) is offering a family of cartridge filters that it claims improve water quality and reduce total cost of filtration for ultrapure water (UPW) and de-ionised (DI) water used in the manufacture of semiconductors and silicon wafers.

Gore has engineered filters that the company says offer 3x the flow rate of best-in-class filters without sacrificing particle retention. They can also provide a more economical alternative to ultrafiltration (UF) modules.

Users include a US semiconductor fab that replaced its nylon pre-filters with Gore 0.01µm filters in its UPW facility. The high flow rate of the Gore filters enabled the manufacturer to replace 840 10in equivalents with 210, reducing its total cost of filtration by more than 50%.


TSMC Shanghai demonstrated that the Gore HR (high retention) filters provide a significantly lower-cost alternative (50% less capital expenditure) to ultrafiltration modules and will meet the needs for most ultrapure water systems.

In addition, a major semiconductor manufacturer in Asia has replaced a large-pore-size guard filter with Gore 0.1µm filters instead of installing an additional skid of UF filters to address periodic water quality problems, provide protection against system upsets, and reduce baseline counts during normal operations.

Gore filters incorporate the company’s proprietary high-flow ePTFE (expanded polytetrafluoroethylene) filtration media.

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