Pfeiffer Vacuum launches Dry Particle Counter ADPC 302

Monitors particles in semiconductor production and localises and counts particles from the carrier surfaces in wafer transport carriers

The ADPC 302 from Pfeiffer Vacuum

The ADPC 302 from Pfeiffer Vacuum is an in-process system for particle contamination monitoring in the semiconductor industry. The product measures the number of particles in wafer transport carriers, such as a Front Opening Unified Pod (FOUP) and Front Opening Shipping Box (FOSB). The fully automated patented process localises and counts particles from the carrier surfaces, including the door.

Pfeiffer says sub-micrometre particles can cause defects that may lead to considerable yield loss. Even the smallest particles measuring 0.1µm may damage the structure of semiconductor chips. This system can be used for both serial production and R&D analysis. Its main applications are in carrier characterisation, cleaning strategy optimisation and cleaning quality check.

The company says the dry process (Dry Particle Counter) of the ADPC has clear benefits over the traditional wet method (Liquid Particle Counter).

The main advantage is that the particle measurement is completely automated. It is integrated in the production process and therefore does not require time outside the production period, nor does it require an additional operator. The test time is only seven minutes, making it possible to test eight transport carriers in an hour.

The ADPC 302 complements the Pfeiffer Vacuum portfolio of contamination solutions for the semiconductor industry featuring the FOUPs molecular contamination analyser APA 302 and the FOUPs regenerator APR 4300.

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