Trumpf invests €70m in new EUV facility

The multi-storey facility will include not only production areas and cleanrooms but also zones for testing and startup

Architect’s drawing of the new EUV facility and office complex.
Courtesy of Barkow Leibinger

Hi tech manufacturer Trumpf, of Germany, is investing €70m in expanding its headquarters and will include extreme-ultraviolet (EUV) microchip production technology.

New buildings covering an area of almost 366,000ft2 (34,000m2) will be built in the next two years. The multi-storey facility will include not only production areas and cleanrooms but also zones for testing and startup. Office space for 270 workers is also being built.

The project is being planned by the architectural firm Barkow Leibinger. The investment sum includes the costs of construction, as well as set-up of the elaborate building automation required by EUV technology.

The new buildings will be used primarily by subsidiary Trumpf Lasersystems for Semiconductor Manufacturing, which produces and develops laser amplifiers and related components. The lasers will enable the creation of 10nm structures on microchips that will make smartphones and other electronic devices more powerful than they are today.

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