HamaTech welcomes 30th shipment of cleaning system

Published: 30-Jun-2008

HamaTech, a market leader in the supply of semiconductor equipment from Sternenfels in Germany, has sent its 30th shipment of MaskTrack photomask cleaning system for installation.


The HamaTech Ape has been established as a key enabler for the rapid adoption of 45nm photolithography processes. The MaskTrack is claimed to extend the lifetime of critical photomasks saving customers over US$1.1m per annum over conventional systems.

‘Since its introduction, the MaskTrack system has been quickly adopted as the tool of record by mask shops and semiconductor manufacturers worldwide for advanced processing,’ said Wilma Koolen-Hermkens, chief executive officer of HamaTech APE. ‘Our MaskTrack system was the first in the industry to deliver proven results for the toughest lithography process cleaning challenges at 45nm and beyond. And, as the one company dedicated to the science of cleaning, we are aligned with key partners in the photolithography process to meet the next technology challenges presented at 22nm and Extreme Ultraviolet Lithography (EUVL).’

Fundamental to MaskTrack’s differentiated performance is the capability to control process parameters allowing an unparalleled variety of surface materials to be cleaned on a single tool with zero adjustment downtime. Combined with inspection and repair feedback for targeted cleaning of specific areas of the mask, MaskTrack delivers 100% particle removal efficiency (PRE) and industry-recognised highest first-pass yield results. The system’s modular design, fully qualified for the complete range of 193i immersion lithography processes, has been established in various mask manufacturing and advanced Wafer Fab environments and is in final qualification stages for the next generation of 22nm device nodes.

Over 500 HamaTech systems, including MaskTrack, are installed at semiconductor manufacturers and mask shops worldwide. For the last 20 years, HamaTech cleaning innovation has been used to enable the photolithography process at every advanced technology node. The company will be exhibiting at Semicon West 2008 from 15-17 July at the Moscone Center in San Francisco, California.

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