Materion to construct multi-million dollar wafer level coating cell
For infra-red wafer level products
Materion Barr Precision Optics & Thin Film Coatings is building a 3,000ft2 Class 1000 cleanroom fitted with the latest infra-red coating chambers and 3D patterning equipment in a multi-million dollar investment.
The US producer of thin film coatings and optical filters said the work cell would significantly enhance its capability to manufacture low-defect coatings in high volume for the infra-red wafer level, defence and consumer electronics markets.
The self-contained wafer level coating cell, located at Materion's facility in Westford, Massachusetts, will handle 200mm wafers.
According to the company, it will assist in lowering the cost of uncooled micro bolometer detectors and ultimately facilitate major growth throughout the commercial infra-red camera industry.
The work cell should be completed by the third quarter and will include a state-of-the art 3D photolithography deposition tool, semiconductor wet etch and alignment processing tools, semi-automated inspection tools, and several custom-designed high-volume 200mm coating deposition chambers. It will be capable of producing 20,000–40,000 wafers a year when fully completed.
Initially work will be composed of multiple volume production lines along with current projects aimed at the defence, commercial infra-red and consumer electronics markets.
Materion will continue to refine processes and operations during the following year to maximise yields, optimise processes and ramp-up to full capacity.
In addition, the company will continue to invest in its coating technology for the next-generation micro-bolometer devices (less than 12 micron) and plans to unveil this new technology in 2014.