Real-time online slurry monitoring in Copper CMP

Published: 28-May-2003


The SlurryAlert from Particle Measuring Systems provides continuous online measurements of undiluted slurry used in Copper CMP in the semiconductor industry.

The company says it rapidly detects changes in particle size distribution and number of large diameter particles, as well as shifts in percent solids. SlurryAlert BTA Monitor provides continuous one minute measurements of BTA in the chemical delivery system. These systems are said to be extremely stable and very low maintenance, requiring almost no operator involvement. "Monitoring of undiluted alumina, cerium and silica slurry eliminates waste streams and troublesome valves," says the company. "Real-time monitoring allows users to increase yield by preventing wafer scratching."

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In regulated manufacturing, monitoring environmental conditions and critical equipment is essential to protect product quality, yield, and patient safety. Facilities often use a Facility Monitoring System (FMS) to track factors like airborne particles, temperature, and humidity. Beyond regulatory compliance, FMS delivers real business value through reduced waste, improved yield, higher quality, and greater profitability

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