7.6 million Euros for Innos photolithography upgrade

Published: 17-Jun-2004


Southampton-based research and development company Innos who specialise in Silicon, MEMS and nanotechnologies has invested five million pounds (e7.6 million) to upgrade its photolithography capability, including purchase of the UK's first JBX-9300FS electron-beam lithography system. The new equipment, installed at its 1000m2 cleanroom in Southampton is part of Innos' strategy to provide a complete service to industry and academic institutions. "The JBX 9300FS installation at Innos is the first unit of its kind in the UK, and will enable the next generations of nano-electronic devices to be produced, also allowing nano-technological research to prosper in the correct environment," explains the Senior General Sales Manager at JEOL UK, Roger Hockham. The JBX-9300FS is a state-of-the-art system featuring a spot beam with a diameter of 4nm at 100kV, vector scan, and a step and repeat stage. It is capable of varying the beam size widely, with a guaranteed minimum linewidth of less than 20nm with overlay and stitching accuracies of comparable dimensions. Electron-beam lithography uses a focused electron beam to write ultra fine patterns on semiconductor substrates covered by a resist material. The system is currently in the final stages of installation and commissioning at Innos and acceptance tests are due to be completed by the end of June 2004.

Tel: +44(0)1962 888100 innos@mccint.com

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