DuPont Photomasks begins production in Dresden

Published: 14-Jun-2004


DuPont Photomasks has begun commercial production at its photomask production facility in Dresden, Germany. The new facility is the keystone for its production of advanced photomask technologies that will support semiconductor devices with design rules of 65nm and below. "DuPont Photomasks' new campus in Dresden expands our ability to supply customers with the advanced photomask technologies they have come to rely on from us," said Marshall Turner, chairman and chief executive officer. "The unique design of our operations in Dresden will provide our global customer base with next generation photomask technologies in support of their roadmaps." DuPont Photomasks' Dresden facility is co-located with the Advanced Mask Technology Center (AMTC), a joint venture photomask research and development centre owned by Advanced Micro Devices, Infineon Technologies and DuPont Photomasks. By combining research and commercial production in the same cleanroom, they will rapidly transfer optimised photomask technologies from development to volume production. In addition to leveraging operational efficiencies, over time the Dresden facility plans to acquire the advanced equipment currently used for research and development at the AMTC for commercial production of tomorrow's most advanced photomasks. The company's Dresden facility includes a 1,400m2 cleanroom with advanced e-beam and laser photomask pattern generators, along with other advanced processing, inspection, metrology, cleaning and repair tools.

Tel: +1 512 310 6562 tom.blake@photomask.com

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