Extraction's monitoring toolset

Published: 2-Feb-2005


Extraction has introduced a complete toolset for detecting and measuring lithography molecular contamination at ultra low levels.

Its new tools, the TMB-193 and the LithoScout, address the need for both continuous and periodic monitoring of molecular contamination in 193nm environments. The TMB-193 is said to be the only monitor capable of detecting and measuring most base contaminants of concern without the need to be tuned to individual compounds. As a companion tool to the TMB-193, the LithoScout sampling and reporting system offers a fast, precise and convenient means of collecting and reporting these measurements. According to Extraction, it is the only packaged air and gas sampling system specifically designed for simultaneously detecting low-level acid, base and organic contamination in lithography applications. The introduction of the TMB-193 and the LithoScout comes just six months after an international group of lithography experts concluded that continuous monitoring of the 193nm resist process environment is needed to ensure size uniformity in critical device features, while simple, cost-effective, and accurate ultra trace-level gas analysis is needed to meet lithography tool lens warranty requirements. A number of TMB-193 systems have been bought by a Japanese customer to support its need to monitor for molecular contamination in 193nm lithography tools.

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