Further expansion at Innos with 1.48m Euro investment in cleanroom
Southampton-based research and development company Innos, which specialises in silicon, MEMS and nanotechnologies, has invested a further 1.48m Euros in its 1000m2 microelectronics cleanroom. The purchase of the Varian E500HP high performance ion implantation system allows Innos to alter the near surface properties of semiconductor materials. The state-of-the-art ion implantation system enables doping of 200mm wafers, safe gas handling (SDS), low contamination (metals and particulates), variable implant angle, wide energy range and large dose range. CEO of Innos, Stephen Byars, commented: "The continued investment in technology is part of our ongoing commitment to work with industry, to push the boundaries of silicon innovation. Innos currently has a number of research projects in process in areas such as silicon-based devices, photonic devices, MEMs and quantum technologies." Installation of the new implanter follows Innos' announcement of a £5m investment in the UK's first JBX-9300FS electron-beam lithography system that enables it to provide R&D to below 10nm. In addition to the new implanter and electron-beam lithography system, the purpose-built cleanroom also includes steppers and contact aligners for optical lithography, all in a Class 100 environment. In addition to conventional silicon processing equipment, the Innos cleanroom has a deep reactive ion etcher, ion beam miller, chemical mechanical polisher, low pressure epitaxy cluster tools and an advanced sputtering unit.