Real-time air monitoring

Published: 28-May-2003


Molecular Analytics' AirSentry-IMS AMC System was officially launched at Semicon Europa. The company claims the system is the first analytical tool for complete real-time monitoring of cleanroom air quality.

As well as determining well known amines and acids, the system provides full determination and speciation of VOCs. Molecular Analytics, a subsidiary of SAES Getters Group, said that contamination control efforts have traditionally focused on particle measuring and filtering, but the importance of evaluating the impact of airborne molecular contamination (AMC) on semiconductor manufacturing yield is now recognised. The company claimed the real-time data availability represented the first significant step toward the AMC control strategy: "Only after identifying the potential contaminants is it possible to establish the correlation with process conditions, facility design and wafer 'defectivity', which is key to setting a control strategy. Results collected during the beta test of the new system at major semiconductor facilities have proven the value of the real time approach" Cost savings are also claimed, as continuous monitoring of the filter status ensures filters are changed on a real need basis, rather than on a pre-programmed schedule, thus cutting down expenses for unnecessary replacement. Also launched at the show was the AirSentry-IMS POC System for real-time detection of photochemical organic contaminants and silicones/siloxanes within the litho tools. The system uses Photo Acoustic Spectroscopy (PAS) to measure the POC and Si-O contamination, and to individually quantify methane, non-methane hydrocarbons and silicone compounds. The company said the PAS method exploits narrow band IR interference filters specific to both POC and Si-O compounds with much greater sensitivity, stability and lower detection limits than other techniques. The PAS instrument can be combined with other IMS-based analysers to give monitoring capability for Total Amines, Ammonia, NMP, POC and Si-O from one monitoring system.

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